The higher Hall mobility compared to the field-effect mobility is due to the removal of the influence from the contact barrier and the surface adsorbates such as H 2 O or O 2 in high vacuum chamber during the Hall measurement. These adsorbates can act as scattering centres to reduce the mobility. Ver mais So far, two-dimensional (2D) materials have attracted numerous attentions due to their unique physical properties such as tunable band structures, atomically thin profile, strong … Ver mais In summary, the tellurium flakes and wires were successfully prepared using the facile and scalable PVD method. We achieved the record … Ver mais The tellurium was grown directly on the SiO2/Si substrate using the PVD method, the details for the growth procedure can be found in §4. Figure 1a shows the optical microscopy … Ver mais High-quality mixtures of Te flakes and wires were grown in a tube furnace using the PVD method under ambient condition and some of them were grown in tilted form. In brief, high … Ver mais WebDesigning highly efficient hole transport materials (HTMs) for PSCs may be one of the effective ways. Herein we theoretically designed three new HTMs (FDT−N, FDT−O, and …
Designing Hole Transport Materials with High Hole …
Web25 de nov. de 2013 · In the present study, a high-hole-mobility transistor (HHMT) with an undoped Ge channel is designed and characterized by device simulation. 16 16. Atlas User's Manual: Device Simulation Software (Silvaco, Inc., Santa Clara, USA, 2013). By using an intrinsic Ge channel, there is no loss in hole mobility owing to dopant … WebThe fabricated detectors show a capability of detecting 241 Am 5.49 MeV α particles with a well resolved full energy peak. The calculated hole mobility ( μh) and hole mobility lifetime product ( μτ) h are 3.40 cm 2 V −1 s −1 and 8.50 × 10 −5 cm 2 V −1, respectively. kitchenaid pro 6 plus
High hole mobility and light-harvesting in discotic nematic …
Web1 de abr. de 2024 · In this study, we show that pure high-density amorphous Ge has exceptionally high carrier mobility, in the order of ∼100 cm ² /Vs, and a high hole concentration of ∼10 ¹⁸ cm ⁻³ . Web5 de nov. de 2024 · Exceptional hole mobilities are measured for polycrystalline GaSb on SiO 2 in the range of 9–66 cm 2 /Vs, exceeding the reported values for many other semiconductors grown at low temperatures. A mobility of 9.1 cm 2 /Vs is recorded for an amorphous GaSb layer in a poly-GaAs/amorphous GaSb heterostructure. Web5 de ago. de 2016 · For lightly Mg-doped GaN films ([Mg] = 7.9 × 10 17 cm −3), the hole mobility reached 34 cm 2 V −1 s −1 at RT. The hole mobilities of our samples were as … kitchenaid pro blender repair